Combined Focused Electron Beam-Induced Deposition and Etching for the Patterning of Dense Lines without Interconnecting Material
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DOI: 10.3390/mi12010008
Abstract: High resolution dense lines patterned by focused electron beam-induced deposition (FEBID) have been demonstrated to be promising for lithography. One of the challenges is the presence of interconnecting material, which is often carbonaceous, between the… read more here.
Keywords: interconnecting material; beam induced; material; dense lines ... See more keywords