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Published in 2018 at "Electronics Letters"
DOI: 10.1049/el.2018.1066
Abstract: Fermi-level depinning in germanium (Ge) through nitrogen (N2) plasma treatment is demonstrated. The Ge surface was exposed to N2 plasma for 1 min without heat treatment, resulting in the formation of 2.5 nm-thick GeO x…
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Keywords:
level depinning;
treatment;
depinning germanium;
nitrogen plasma ... See more keywords