CVD-deposited Cu2O thin-films with record hole mobility of 263 cm2/Vs and field-effect mobility of 0.99 cm2/Vs
Sign Up to like & getrecommendations! Published in 2023 at "Journal of Materials Chemistry C"
DOI: 10.1039/d3tc00789h
Abstract: Cu2O is one of the few p-type semiconductor oxides that allow hole-transport, making it useful for a range of electronic applications like p-channel thin film transistors (TFTs). Unfortunately, unlike n-type... read more here.
Keywords: deposited cu2o; hole; mobility; cu2o thin ... See more keywords