Comparison of the properties of a-C:H films deposited from methane and heptane precursors: study of the mechanical, chemical and structural properties
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DOI: 10.1016/j.tsf.2019.137733
Abstract: Abstract In this work, thin films of hydrogenated amorphous carbon (a-C:H) were deposited on silicon substrates from heptane and methane precursors by the radio frequency plasma-enhanced chemical vapor deposition (PECVD) technique, varying the self-bias voltage… read more here.
Keywords: comparison properties; deposited methane; methane; deposition ... See more keywords