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Published in 2021 at "ACS nano"
DOI: 10.1021/acsnano.1c04086
Abstract: Printed component sizes in electronic circuits are approaching 10 nm, but inherent variability in feature alignment during photolithography poses a fundamental barrier for continued device scaling. Deposition-based self-aligned patterning is being introduced, but nuclei defects…
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Keywords:
deposition;
deposition etching;
thin film;
self aligned ... See more keywords
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Published in 2017 at "Journal of Applied Physics"
DOI: 10.1063/1.4995278
Abstract: Our recently reported multifunctional plasma and deposition sensor [Welzel et al., Appl. Phys. Lett. 102, 211605 (2013)] was used for the characterization of two different plasma sources: a magnetron sputtering deposition source and an ion…
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Keywords:
characterization;
deposition etching;
plasma;
deposition ... See more keywords