Photoinduced Reorientation and Surface Relief Formation in Diblock and Random Copolymers with Benzoic Acid and Alkyloxy Side Groups
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DOI: 10.1021/acs.macromol.8b01071
Abstract: Diblock and random copolymers are synthesized from a methacrylate with benzoic acid (BA) side groups and a n-butyl methacrylate, and the photoinduced reorientation of thin films doped with a N-benzylideneaniline carboxylic acid (NBA), which governs… read more here.
Keywords: random copolymers; diblock random; side groups; reorientation ... See more keywords