Temperature dependence of the sticking coefficients of bis-diethyl aminosilane and trimethylaluminum in atomic layer deposition
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DOI: 10.1116/1.4971197
Abstract: In this paper, the authors present the temperature dependent sticking coefficient (SC) of bis-diethyl aminosilane (BDEAS) and trimethylaluminum (TMA) in atomic layer deposition. SiO2 from BDEAS and ozone at substrate temperatures between 200 and 350 °C… read more here.
Keywords: temperature; atomic layer; deposition; layer deposition ... See more keywords