Digital Etching of Molybdenum Interconnects Using Plasma Oxidation
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DOI: 10.1002/admi.202400558
Abstract: Molybdenum (Mo) has a high potential of becoming the material of choice for sub‐10 nm scale metal structures in future integrated circuits (ICs). Manufacturing at this scale requires exceptional precision and consistency, so many metal… read more here.
Keywords: molybdenum interconnects; plasma oxidation; metal; digital etching ... See more keywords
Control of V th of the enhancement high-frequency AlGaN/GaN HEMT fabricated by oxygen-based digital etching
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DOI: 10.35848/1882-0786/ac32a6
Abstract: We established an oxygen-based digital etching technique to fabricate the recessed gate structure for RF GaN HEMT. The digital etching rates were 2.5 nm cycle–1 and 0.5 nm cycle–1 with 40 W RF bias and… read more here.
Keywords: digital etching; control enhancement; oxygen based; gan hemt ... See more keywords