Analyses of pattern quality in roll-to-roll digital maskless lithography with positional errors.
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DOI: 10.1364/ao.416623
Abstract: In roll-to-roll digital maskless lithography (R2R DML) equipment, it is difficult to achieve high quality, owing to surface deformation that affects the pattern position. To address this issue, we simulated the patterning results of R2R… read more here.
Keywords: maskless lithography; roll roll; roll digital; digital maskless ... See more keywords