A direct atomic layer deposition method for growth of ultra-thin lubricant tungsten disulfide films
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DOI: 10.1007/s11431-016-0538-x
Abstract: We describe a direct atomic layer deposition method to grow lubricant tungsten disulfide (WS2) films. The WS2 films were deposited on a Si (100) substrate and a zinc sulfide (ZnS) film coated the Si (100)… read more here.
Keywords: deposition method; layer; atomic layer; ws2 films ... See more keywords