Discharge physics and atomic layer etching in Ar/C4F6 inductively coupled plasmas with a radio frequency bias
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DOI: 10.1063/5.0047811
Abstract: Atomic layer etching (ALE), a cyclic process of surface modification and removal of the modified layer, is an emerging damage-less etching technology for semiconductor fabrication with a feature size of less than 10 nm. Among the… read more here.
Keywords: atomic layer; step; physics; layer etching ... See more keywords