Advanced Atomic Layer Deposition: Ultrathin and Continuous Metal Thin Film Growth and Work Function Control Using the Discrete Feeding Method.
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DOI: 10.1021/acs.nanolett.2c00811
Abstract: The ultrathin and continuous ruthenium (Ru) film was deposited through an improved atomic layer deposition (ALD) process with a discrete feeding method (DFM), called DF-ALD, employing a cut-in purge step during the precursor feeding. The… read more here.
Keywords: ultrathin continuous; layer deposition; discrete feeding; atomic layer ... See more keywords