Multi-layering of SU-8 exhibits distinct geometrical transitions from circular to planarized profiles.
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DOI: 10.1063/1.5139031
Abstract: The negative tone photoresist SU-8 permits the creation of micrometer-scale structures by optical lithography. It is also the most used photoresist in soft lithography for the fast-prototyping of microfluidic devices. Despite its importance, the effect… read more here.
Keywords: geometrical transitions; transitions circular; distinct geometrical; exhibits distinct ... See more keywords