Influence of hydrogen dilution and doping gas on the material properties of plasma-deposited polycrystalline silicon thin films
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DOI: 10.1016/j.tsf.2020.138220
Abstract: Abstract We studied the effects of precursor gas composition and the addition of dopant gas, PH3, on polycrystalline silicon films deposited using plasma-enhanced chemical vapor deposition. Spectroscopic ellipsometry measurement and modeling results revealed that the… read more here.
Keywords: poly films; gas; hydrogen dilution; dopant gas ... See more keywords