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Published in 2017 at "Semiconductors"
DOI: 10.1134/s1063782617110148
Abstract: The effect of technological parameters on the selective manganese doping of arsenide–gallium heterostructures fabricated by a combination of methods of MOS-hydride epitaxy and pulsed-laser deposition is investigated. As these parameters, the impurity content in the…
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Keywords:
manganese doping;
features selective;
selective manganese;
gaas structures ... See more keywords