Effects of illumination non-uniformity on the double-Ronchi lateral shearing interference field.
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DOI: 10.1364/ao.470406
Abstract: Double-Ronchi shearing interferometry is a promising technique for insitu wavefront aberration measurement of the projection lens in photolithography systems. In practice, the non-uniformity of illumination is an important issue affecting the interference field, which has… read more here.
Keywords: double ronchi; interference field; non uniformity; uniformity ... See more keywords