Sign Up to like & get
recommendations!
1
Published in 2019 at "Microelectronics Reliability"
DOI: 10.1016/j.microrel.2019.113407
Abstract: Abstract Cobalt (Co) and ruthenium (Ru) have been proposed for novel metallization schemes to replace copper in next generation BEOL systems that will use ultra-thin oxide layers. Using TDDB measurements performed on planar capacitors we…
read more here.
Keywords:
drift;
thin oxides;
ultra thin;
drift ultra ... See more keywords