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Published in 2020 at "Nanoscale"
DOI: 10.1039/c9nr10420h
Abstract: Direct machining and imprinting of Si are beneficial for simplifying the fabrication of microelectromechanical systems, nanoelectromechanical systems, optical devices, and fin field-effect transistors, and for reducing process costs. Electrochemical micromachining has been introduced for highly…
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Keywords:
electrochemical local;
silicon etchant;
local etching;
condensation ... See more keywords