Sign Up to like & get
recommendations!
1
Published in 2019 at "ACS Applied Nano Materials"
DOI: 10.1021/acsanm.9b02153
Abstract: An atomic layer deposition (ALD) process is reported for the growth of nanoscale PrAlO3 thin films for two-dimensional electronics and memory device applications using tris(isopropylcyclopentadieny...
read more here.
Keywords:
dimensional electronics;
atomic layer;
two dimensional;
layer deposition ... See more keywords