Formation of Nano-Fibrous Patterns on Aluminum Substrates via Photolithographic Fabrication of Electrospun Photosensitive Polyimide Fibrous Membranes
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DOI: 10.3390/nano12162745
Abstract: The formation of polymeric micro-patterns on various substrates via a photolithography procedure has been widely used in semiconductor fabrication. Standard polymer patterns are usually fabricated via photosensitive polymer varnishes, in which large amounts of potentially… read more here.
Keywords: fibrous membranes; substrates via; procedure; electrospun photosensitive ... See more keywords