Articles with "end line" as a keyword



Fully Transparent Epitaxial Oxide Thin‐Film Transistor Fabricated at Back‐End‐of‐Line Temperature by Suboxide Molecular‐Beam Epitaxy

Sign Up to like & get
recommendations!
Published in 2024 at "Advanced Electronic Materials"

DOI: 10.1002/aelm.202400499

Abstract: Transparent oxide thin film transistors (TFTs) are an important ingredient of transparent electronics. Their fabrication at the back‐end‐of‐line (BEOL) opens the door to novel strategies to more closely integrate logic with memory for data‐intensive computing… read more here.

Keywords: back end; beam; molecular beam; thin film ... See more keywords

Is it the end of the line for Light Water Reactor technology or can China and Russia save the day?

Sign Up to like & get
recommendations!
Published in 2019 at "Energy Policy"

DOI: 10.1016/j.enpol.2018.10.062

Abstract: Abstract In the late 1990s, a new generation of reactor designs evolved from existing designs was touted as solving the economic problems that led to the collapse of reactor ordering after the Chernobyl disaster. It… read more here.

Keywords: end line; line light; water reactor; light water ... See more keywords

An ultra high-endurance memristor using back-end-of-line amorphous SiC

Sign Up to like & get
recommendations!
Published in 2024 at "Scientific Reports"

DOI: 10.1038/s41598-024-64499-2

Abstract: Integrating resistive memory or neuromorphic memristors into mainstream silicon technology can be substantially facilitated if the memories are built in the back-end-of-line (BEOL) and stacked directly above the logic circuitries. Here we report a promising… read more here.

Keywords: memristor; back end; amorphous sic; endurance ... See more keywords

The end of the line: competitive exclusion and the extinction of historical entities

Sign Up to like & get
recommendations!
Published in 2023 at "Royal Society Open Science"

DOI: 10.1098/rsos.221210

Abstract: Identifying competitive exclusion at the macroevolutionary scale has typically relied on demonstrating a reciprocal, contradictory response by two co-occurring, functionally similar clades. Finding definitive examples of such a response in fossil time series has proven… read more here.

Keywords: exclusion extinction; line competitive; exclusion; competitive exclusion ... See more keywords

Multilevel Operation in Scaled Back-End-of-Line Ferroelectric FETs With a Metal Interlayer

Sign Up to like & get
recommendations!
Published in 2025 at "IEEE Access"

DOI: 10.1109/access.2025.3561255

Abstract: Multi-level operation, conventionally obtained in ferroelectric devices thanks to a domain-dependent inhomogeneous polarization, poses a big challenge for highly-scaled ferroelectric devices, where the number of ferroelectric domains is drastically reduced. In this work, we study… read more here.

Keywords: back end; metal interlayer; operation; end line ... See more keywords

A Compute-in-Memory Hardware Accelerator Design With Back-End-of-Line (BEOL) Transistor Based Reconfigurable Interconnect

Sign Up to like & get
recommendations!
Published in 2022 at "IEEE Journal on Emerging and Selected Topics in Circuits and Systems"

DOI: 10.1109/jetcas.2022.3177577

Abstract: Compute-in-memory (CIM) paradigm using ferroelectric field effect transistor (FeFET) as the weight element is projected to exhibit excellent energy efficiency for accelerating deep neural network (DNN) inference. However, two challenges exist. On the technology level,… read more here.

Keywords: design; compute memory; back end; end line ... See more keywords

Back-End-of-Line Nano-Electro-Mechanical Switches for Reconfigurable Interconnects

Sign Up to like & get
recommendations!
Published in 2020 at "IEEE Electron Device Letters"

DOI: 10.1109/led.2020.2974473

Abstract: Non-volatile (NV) nano-electro-mechanical (NEM) switches are successfully implemented using multiple metallic layers in a standard 65 nm CMOS back-end-of-line (BEOL) process with no additional lithography steps. Non-volatile operation of a NEM switch as a reconfigurable… read more here.

Keywords: end line; electro mechanical; nano electro; back end ... See more keywords

Back-End-of-Line Compatible Transistors for Monolithic 3-D Integration

Sign Up to like & get
recommendations!
Published in 2019 at "IEEE Micro"

DOI: 10.1109/mm.2019.2942978

Abstract: The manufacturers of high-performance logic have been ardent champions of Moore's Law, which has resulted in exponential increase in aerial transistor density to 100 million transistors per square millimeter of silicon real estate. However, it… read more here.

Keywords: end line; compatible transistors; line compatible; integration ... See more keywords

Fault Diagnosis of Wafer Acceptance Test and Chip Probing Between Front-End-of-Line and Back-End-of-Line Processes

Sign Up to like & get
recommendations!
Published in 2022 at "IEEE Transactions on Automation Science and Engineering"

DOI: 10.1109/tase.2021.3106011

Abstract: With the rapid development of the semiconductor industry, fault diagnosis is an important task in routine operations to determine the root cause for faults that occur. A tool in manufacturing processes is equipped with a… read more here.

Keywords: fault diagnosis; end line; process;

PROBE: A Placement, Routing, Back-End-of-Line Measurement Utility

Sign Up to like & get
recommendations!
Published in 2018 at "IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems"

DOI: 10.1109/tcad.2017.2750072

Abstract: In advanced technology nodes, correctly choosing among available back-end-of-line (BEOL) stack options is important to meet stringent design quality of results requirements. However, it is nontrivial to evaluate BEOL stack options since the routing outcomes… read more here.

Keywords: back end; end line; beol stack; design ... See more keywords

A Proactive Approach of Optimizing Real-Time Equipment Monitoring Settings for Enhancing End-of-Line Yield

Sign Up to like & get
recommendations!
Published in 2025 at "IEEE Transactions on Semiconductor Manufacturing"

DOI: 10.1109/tsm.2025.3574015

Abstract: In semiconductor manufacturing, wafer acceptance test (WAT) data consists of end-of-line (EOL) electrical parameters reflecting product quality and process capability, while in-line equipment plays a crucial role in shaping these outcomes. Engineers collect real-time monitoring… read more here.

Keywords: real time; yield; equipment; end line ... See more keywords