End-to-end pattern optimization technology for 3D shape measurement.
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DOI: 10.1364/ao.431652
Abstract: The nonlinear errors caused by the gamma effect seriously affect the measurement accuracy of phase-measuring profilometry systems. We present a novel robust end-to-end pattern optimization technology for phase-height mapping. This method generates standard sinusoidal patterns… read more here.
Keywords: optimization; end end; end; end pattern ... See more keywords