On the role of the energetic species in TiN thin film growth by reactive deep oscillation magnetron sputtering in Ar/N-2
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DOI: 10.1016/j.tsf.2017.10.052
Abstract: Abstract The properties of TiN films deposited by direct current magnetron sputtering strongly depends on the composition of the discharge since the N2 fraction is the main deposition parameter controlling the poisoning of the target… read more here.
Keywords: magnetron sputtering; energetic species; tin films; films deposited ... See more keywords