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Published in 2019 at "Journal of Electronic Materials"
DOI: 10.1007/s11664-019-07840-0
Abstract: For this proposed work, structural, electrical and ferroelectric properties of metal-insulator-silicon (MIS) and metal-insulator-metal (MIM) capacitors with different HfO2 (5 nm, 10 nm, 15 nm, 20 nm) thicknesses deposited on silicon and TiN/Silicon were investigated. The structural properties such…
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Keywords:
enhanced atomic;
layer;
atomic layer;
layer deposited ... See more keywords
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Published in 2019 at "Microelectronic Engineering"
DOI: 10.1016/j.mee.2019.111013
Abstract: Abstract We investigated the characteristics of 10-nm-thick ferroelectric Hf0.43Zr0.57O2 (HZO) thin films fabricated using plasma-enhanced atomic layer deposition (PE-ALD) at 300 °C with plasma O2 gas and a post metallization annealing (PMA) process at 300–400 °C. The…
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Keywords:
thin films;
plasma enhanced;
process;
plasma ... See more keywords
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Published in 2017 at "Thin Solid Films"
DOI: 10.1016/j.tsf.2017.03.025
Abstract: Abstract We have studied the presence of residual chlorine in thin TiO 2 films grown by plasma enhanced atomic layer deposition (PEALD) at temperatures within 40–250 °C range, using x-ray photoemission spectroscopy, secondary ion mass spectrometry,…
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Keywords:
residual chlorine;
enhanced atomic;
films grown;
chlorine ... See more keywords
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Published in 2020 at "ACS applied materials & interfaces"
DOI: 10.1021/acsami.0c06879
Abstract: We report plasma-enhanced atomic layer deposition (ALD) to prepare conformal nickel thin films and nanotubes by using nickelocene as a precursor, water as the oxidant agent and an in-cycle plasma enhanced reduction step with hydrogen.…
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Keywords:
enhanced atomic;
atomic layer;
layer deposition;
nickel nanotubes ... See more keywords
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Published in 2017 at "Dalton transactions"
DOI: 10.1039/c7dt03303f
Abstract: Nitrogen-doped TiO2 is in situ synthesized by plasma enhanced atomic layer deposition on carbon nanotubes (N-TiO2/CNTs). The prepared N-TiO2/CNT nanocomposites are employed as anode materials for sodium ion batteries. The specific capacity of an N-TiO2/CNT…
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Keywords:
enhanced atomic;
nitrogen doping;
atomic layer;
layer deposition ... See more keywords
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Published in 2019 at "Journal of Materials Chemistry A"
DOI: 10.1039/c9ta08929b
Abstract: Plasma-enhanced atomic-layer-deposited GaN thin-films have been introduced into planar perovskite solar cells as electron transport layers.
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Keywords:
enhanced atomic;
layer;
atomic layer;
planar perovskite ... See more keywords
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Published in 2022 at "Nanotechnology"
DOI: 10.1088/1361-6528/ac8d6d
Abstract: Polymeric materials, including polyethylene terephthalate (PET), are widely used in various fields because of their beneficial properties. Functional films are deposited on these materials through different approaches, such as plasma-enhanced atomic layer deposition (PEALD), to…
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Keywords:
enhanced atomic;
polyethylene terephthalate;
atomic layer;
plasma enhanced ... See more keywords
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Published in 2025 at "Physical Review X"
DOI: 10.1103/physrevx.15.011029
Abstract: Interferometers based on ultracold atoms enable an absolute measurement of inertial forces with unprecedented precision. However, their resolution is fundamentally restricted by quantum fluctuations. Improved resolutions with entangled or squeezed atoms were demonstrated in internal-state…
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Keywords:
atomic gravimeter;
enhanced atomic;
gravimeter;
entanglement enhanced ... See more keywords
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Published in 2024 at "IEEE Transactions on Electron Devices"
DOI: 10.1109/ted.2024.3383401
Abstract: In this study, thin-film transistors (TFTs) with amorphous indium-zinc oxide (IZO) channel were fabricated by plasma-enhanced atomic layer deposition (PEALD). By optimizing the cyclic ratio of laminated ZnO/In2O3, the IZO-TFTs demonstrated a high field-effect channel…
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Keywords:
izo tfts;
layer deposition;
plasma enhanced;
inline formula ... See more keywords
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Published in 2017 at "Journal of Vacuum Science and Technology"
DOI: 10.1116/1.4986945
Abstract: The authors report on the development and application of an atomic layer etching (ALE) procedure based on alternating exposures of trimethylaluminum and anhydrous hydrogen fluoride (HF) implemented to controllably etch aluminum oxide. The ALE process…
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Keywords:
enhanced atomic;
layer;
atomic layer;
aluminum oxide ... See more keywords
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Published in 2018 at "Journal of Vacuum Science and Technology"
DOI: 10.1116/1.5001552
Abstract: A plasma enhanced atomic layer deposition process for synthesizing titanium dioxide (TiO2) films, which allows the film properties to be modified by tuning the ion energies of the discharges, was performed. The films were deposited…
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Keywords:
enhanced atomic;
atomic layer;
film properties;
ion ... See more keywords