Plasma Enhanced Atomic Layer Deposited HfO2 Ferroelectric Films for Non-volatile Memory Applications
Sign Up to like & getrecommendations! Published in 2019 at "Journal of Electronic Materials"
DOI: 10.1007/s11664-019-07840-0
Abstract: For this proposed work, structural, electrical and ferroelectric properties of metal-insulator-silicon (MIS) and metal-insulator-metal (MIM) capacitors with different HfO2 (5 nm, 10 nm, 15 nm, 20 nm) thicknesses deposited on silicon and TiN/Silicon were investigated. The structural properties such… read more here.
Keywords: enhanced atomic; layer; atomic layer; layer deposited ... See more keywords
Ferroelectricity of HfxZr1−xO2 thin films fabricated by 300 °C low temperature process with plasma-enhanced atomic layer deposition
Sign Up to like & getrecommendations! Published in 2019 at "Microelectronic Engineering"
DOI: 10.1016/j.mee.2019.111013
Abstract: Abstract We investigated the characteristics of 10-nm-thick ferroelectric Hf0.43Zr0.57O2 (HZO) thin films fabricated using plasma-enhanced atomic layer deposition (PE-ALD) at 300 °C with plasma O2 gas and a post metallization annealing (PMA) process at 300–400 °C. The… read more here.
Keywords: thin films; plasma enhanced; process; plasma ... See more keywords
Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
Sign Up to like & getrecommendations! Published in 2017 at "Thin Solid Films"
DOI: 10.1016/j.tsf.2017.03.025
Abstract: Abstract We have studied the presence of residual chlorine in thin TiO 2 films grown by plasma enhanced atomic layer deposition (PEALD) at temperatures within 40–250 °C range, using x-ray photoemission spectroscopy, secondary ion mass spectrometry,… read more here.
Keywords: residual chlorine; enhanced atomic; films grown; chlorine ... See more keywords
Plasma-enhanced atomic layer deposition of nickel nanotubes with low resistivity and coherent magnetization dynamics for 3D spintronics.
Sign Up to like & getrecommendations! Published in 2020 at "ACS applied materials & interfaces"
DOI: 10.1021/acsami.0c06879
Abstract: We report plasma-enhanced atomic layer deposition (ALD) to prepare conformal nickel thin films and nanotubes by using nickelocene as a precursor, water as the oxidant agent and an in-cycle plasma enhanced reduction step with hydrogen.… read more here.
Keywords: enhanced atomic; atomic layer; layer deposition; nickel nanotubes ... See more keywords
In situ nitrogen doping of TiO2 by plasma enhanced atomic layer deposition for enhanced sodium storage performance.
Sign Up to like & getrecommendations! Published in 2017 at "Dalton transactions"
DOI: 10.1039/c7dt03303f
Abstract: Nitrogen-doped TiO2 is in situ synthesized by plasma enhanced atomic layer deposition on carbon nanotubes (N-TiO2/CNTs). The prepared N-TiO2/CNT nanocomposites are employed as anode materials for sodium ion batteries. The specific capacity of an N-TiO2/CNT… read more here.
Keywords: enhanced atomic; nitrogen doping; atomic layer; layer deposition ... See more keywords
Plasma-enhanced atomic-layer-deposited gallium nitride as an electron transport layer for planar perovskite solar cells
Sign Up to like & getrecommendations! Published in 2019 at "Journal of Materials Chemistry A"
DOI: 10.1039/c9ta08929b
Abstract: Plasma-enhanced atomic-layer-deposited GaN thin-films have been introduced into planar perovskite solar cells as electron transport layers. read more here.
Keywords: enhanced atomic; layer; atomic layer; planar perovskite ... See more keywords
Dopamine facilitates Al2O3 film growth on polyethylene terephthalate by low-temperature plasma-enhanced atomic layer deposition
Sign Up to like & getrecommendations! Published in 2022 at "Nanotechnology"
DOI: 10.1088/1361-6528/ac8d6d
Abstract: Polymeric materials, including polyethylene terephthalate (PET), are widely used in various fields because of their beneficial properties. Functional films are deposited on these materials through different approaches, such as plasma-enhanced atomic layer deposition (PEALD), to… read more here.
Keywords: enhanced atomic; polyethylene terephthalate; atomic layer; plasma enhanced ... See more keywords
Enhanced atomic layer etching of native aluminum oxide for ultraviolet optical applications
Sign Up to like & getrecommendations! Published in 2017 at "Journal of Vacuum Science and Technology"
DOI: 10.1116/1.4986945
Abstract: The authors report on the development and application of an atomic layer etching (ALE) procedure based on alternating exposures of trimethylaluminum and anhydrous hydrogen fluoride (HF) implemented to controllably etch aluminum oxide. The ALE process… read more here.
Keywords: enhanced atomic; layer; atomic layer; aluminum oxide ... See more keywords
Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
Sign Up to like & getrecommendations! Published in 2018 at "Journal of Vacuum Science and Technology"
DOI: 10.1116/1.5001552
Abstract: A plasma enhanced atomic layer deposition process for synthesizing titanium dioxide (TiO2) films, which allows the film properties to be modified by tuning the ion energies of the discharges, was performed. The films were deposited… read more here.
Keywords: enhanced atomic; atomic layer; film properties; ion ... See more keywords
Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
Sign Up to like & getrecommendations! Published in 2021 at "Journal of Vacuum Science and Technology"
DOI: 10.1116/6.0000842
Abstract: In this study, plasma-enhanced atomic layer deposited indium oxide (InOx) films were analyzed using a new [dimethylbutylamino]trimethylindium (DATI) liquid precursor and Ar/O2 plasma. The growth property using the DATI precursor, such as growth per cycle,… read more here.
Keywords: enhanced atomic; indium oxide; thin film; precursor ... See more keywords
Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
Sign Up to like & getrecommendations! Published in 2017 at "Technical Physics Letters"
DOI: 10.1134/s1063785017010138
Abstract: The possibility of growing oriented AlN films on Al2O3 substrates at temperatures below 300°C by plasma-enhanced atomic layer deposition was examined. The samples were subjected to X-ray phase analysis and ellipsometry. It was demonstrated that… read more here.
Keywords: enhanced atomic; oriented aln; atomic layer; aln films ... See more keywords