Photo from wikipedia
Sign Up to like & get
recommendations!
1
Published in 2021 at "Advanced Materials Interfaces"
DOI: 10.1002/admi.202100438
Abstract: Large‐area epitaxy of layered materials is one of the cornerstones for a successful exploitation of van der Waals (vdW) materials in the semiconductor industry. The formation of 60° twin stacking faults and 60° grain boundaries…
read more here.
Keywords:
epitaxy;
epitaxy chalcogenides;
van der;
der waals ... See more keywords
Photo from wikipedia
Sign Up to like & get
recommendations!
2
Published in 2021 at "Journal of Alloys and Compounds"
DOI: 10.1016/j.jallcom.2021.161086
Abstract: Abstract Low dimensional defects such as dislocation in single crystal Si are known to serve as a fast diffusion path of metal ions. Recently, many efforts have been made to employ dislocations in single crystal…
read more here.
Keywords:
thin films;
assisted solid;
beam assisted;
epitaxy ... See more keywords
Sign Up to like & get
recommendations!
1
Published in 2017 at "Journal of Crystal Growth"
DOI: 10.1016/j.jcrysgro.2016.11.056
Abstract: Using ab initio calculations, a simple model for GaAs1-xNx vapor-phase epitaxy on (100) surface of GaAs was created. By studying As2 and H2 molecules adsorptions and As/N atom substitutions on (100) GaAs surfaces, we obtain…
read more here.
Keywords:
gaas1 xnx;
gaas1;
model;
stability ... See more keywords
Photo from wikipedia
Sign Up to like & get
recommendations!
1
Published in 2019 at "Surface and Coatings Technology"
DOI: 10.1016/j.surfcoat.2018.11.031
Abstract: Abstract Droplet epitaxy technique, the formation of gallium metallic droplets in the ultra-high vacuum and then nitridation with nitrogen plasma, was used to grow GaN nanodots on Si (111) by plasma-assisted molecular beam epitaxy. In…
read more here.
Keywords:
droplet epitaxy;
epitaxy;
phase transformation;
gan nanodots ... See more keywords
Sign Up to like & get
recommendations!
2
Published in 2023 at "Nano letters"
DOI: 10.1021/acs.nanolett.2c04908
Abstract: 3D integration of III-V semiconductors with Si CMOS is highly attractive since it allows combining new functions such as photonic and analog devices with digital signal processing circuitry. Thus far, most 3D integration approaches have…
read more here.
Keywords:
integration inas;
assisted selective;
integration;
epitaxy ... See more keywords
Sign Up to like & get
recommendations!
0
Published in 2019 at "Nano letters"
DOI: 10.1021/acs.nanolett.9b04272
Abstract: Epitaxial lateral overgrowth (ELO) over a freestanding dielectric mask is an unexplored territory in selective epitaxy growth (SEG) of semiconductors. By shrinking the dielectric mask dimension to the micron scale, the growth fronts from ELO…
read more here.
Keywords:
unpredicted internal;
dielectric mask;
reconfiguration;
enclosed space ... See more keywords
Sign Up to like & get
recommendations!
1
Published in 2019 at "ACS nano"
DOI: 10.1021/acsnano.8b08413
Abstract: Semiconductor nanocrystalline heterostructures can be produced by the immersion of semiconductor substrates into an aqueous precursor solution, but this approach usually leads to a high density of interfacial traps. In this work, we study the…
read more here.
Keywords:
free heterostructure;
pbs nanoplatelets;
trap free;
inp 001 ... See more keywords
Photo from wikipedia
Sign Up to like & get
recommendations!
2
Published in 2023 at "Journal of the American Chemical Society"
DOI: 10.1021/jacs.3c02471
Abstract: Precise monolayer epitaxy is important for two-dimensional (2D) semiconductors toward future electronics. Here, we report a new self-limited epitaxy approach, liquid phase edge epitaxy (LPEE), for precise-monolayer epitaxy of transition-metal dichalcogenides. In this method, the…
read more here.
Keywords:
edge;
transition metal;
liquid phase;
epitaxy ... See more keywords
Photo from wikipedia
Sign Up to like & get
recommendations!
0
Published in 2020 at "Scientific Reports"
DOI: 10.1038/s41598-020-59083-3
Abstract: A general problem for semiconductor applications is that very slow deposition on expensive single-crystal substrates yields high crystalline quality with excellent electro-optical properties, but at prohibitive costs and throughput for many applications. In contrast, rapid…
read more here.
Keywords:
single crystal;
epitaxy large;
epitaxy;
scalable ultrafast ... See more keywords
Photo from wikipedia
Sign Up to like & get
recommendations!
0
Published in 2020 at "CrystEngComm"
DOI: 10.1039/c9ce01926j
Abstract: We present Au catalyzed p-GaAs nanowire growth on n-GaN layers as a possible method to grow an arsenide on a nitride compound semiconductor by metal organic vapor phase epitaxy. The GaAs growth position, the nanowire…
read more here.
Keywords:
spatially controlled;
nanowire growth;
nanowire;
growth ... See more keywords
Sign Up to like & get
recommendations!
0
Published in 2018 at "Physical Review Materials"
DOI: 10.1103/physrevmaterials.2.051402
Abstract: Fe3Si/Ge(Fe,Si)/Fe3Si thin-film stacks were grown by a combination of molecular beam epitaxy and solidphase epitaxy (Ge on Fe3Si). The stacks were analyzed using electron microscopy, electron diffraction, and synchrotron x-ray diffraction. The Ge(Fe,Si) films crystallize…
read more here.
Keywords:
structure fege2;
fe3si;
solid phase;
structure ... See more keywords