A study on controllable aluminium doped zinc oxide patterning by chemical etching for MEMS application
Sign Up to like & getrecommendations! Published in 2017 at "Microsystem Technologies"
DOI: 10.1007/s00542-015-2783-1
Abstract: This present work reports on the study of controllable aluminium doped zinc oxide (AZO) patterning by chemical etching for MEMS application. The AZO thin film was prepared by RF magnetron sputtering as it is capable… read more here.
Keywords: microscopy; thin film; azo thin; etch ... See more keywords
Monocrystalline Quartz ICP Etching: Road to High-Temperature Dry Etching
Sign Up to like & getrecommendations! Published in 2019 at "Plasma Chemistry and Plasma Processing"
DOI: 10.1007/s11090-019-10025-6
Abstract: In this study, the dry plasma-chemical etching process of monocrystalline SiO 2 (quartz) in a fluoride-based (sulfur hexafluoride, SF 6 ) inductively coupled plasma (ICP) was investigated. The etching rate ( V etch ) dependencies… read more here.
Keywords: icp; temperature; quartz; etch ... See more keywords
Effect of acid etching on dentin bond strength of ultra-mild self-etch adhesives
Sign Up to like & getrecommendations! Published in 2020 at "International Journal of Adhesion and Adhesives"
DOI: 10.1016/j.ijadhadh.2020.102567
Abstract: Abstract Background Nowadays, most of the dental manufacturers claimed that ‘Universal’ or ‘multi-mode’ adhesives in self-etch technique can obtain good bonding results comparing to etch-and-rinse or selective etching application techniques. The rationale behind this study… read more here.
Keywords: etch rinse; bond; etch; self etch ... See more keywords
Inductively coupled plasma nanoetching of atomic layer deposition alumina
Sign Up to like & getrecommendations! Published in 2018 at "Microelectronic Engineering"
DOI: 10.1016/j.mee.2018.02.023
Abstract: Abstract Al2O3 thin-film deposited by atomic layer deposition is an attractive plasma etch mask for Micro and Nano Electro-Mechanical Systems (MEMS and NEMS). 20-nm-thick Al2O3 mask enables through silicon wafer plasma etching. Al2O3 is also… read more here.
Keywords: plasma; atomic layer; al2o3; plasma etching ... See more keywords
High temperature water as a clean and etch of low-k and SiO2 films
Sign Up to like & getrecommendations! Published in 2018 at "Microelectronic Engineering"
DOI: 10.1016/j.mee.2018.04.016
Abstract: Abstract Water becomes more reactive as a function of temperature in part because the number of hydronium and hydroxyl ions increase. As one approaches the boiling point, the concentration of these species increases over seven… read more here.
Keywords: temperature; water; high temperature; sio2 ... See more keywords
Etch track-directed growth of carbon nanotubes on graphite
Sign Up to like & getrecommendations! Published in 2018 at "Physica E: Low-dimensional Systems and Nanostructures"
DOI: 10.1016/j.physe.2018.07.027
Abstract: Abstract Crystallographically-oriented nanotubes are grown on highly-etched graphite surfaces. The nanotubes are found to align along preferred crystal directions of the graphite surface along the same directions as etch tracks. This indicates that the nanotubes… read more here.
Keywords: directed growth; track directed; etch tracks; etch ... See more keywords
Volatile Etch Species Produced during Thermal Al2O3 Atomic Layer Etching
Sign Up to like & getrecommendations! Published in 2019 at "Journal of Physical Chemistry C"
DOI: 10.1021/acs.jpcc.9b06104
Abstract: The thermal atomic layer etching (ALE) of Al2O3 can be achieved using sequential fluorination and ligand-exchange reactions. Although previous investigations have characterized the etch rates and surface chemistry, no reports have identified the volatile etch… read more here.
Keywords: etch species; atomic layer; chemistry; etch ... See more keywords
Effect of N doping on the microstructure and dry etch properties of amorphous carbon deposited with a DC sputtering system
Sign Up to like & getrecommendations! Published in 2023 at "RSC Advances"
DOI: 10.1039/d2ra06808g
Abstract: The importance of developing a hardmask with excellent performance, and physical and chemical properties to utilize in long-term etching is spotlighted due to the acceleration of development in high-density semiconductors. To develop such a hardmask,… read more here.
Keywords: carbon; sputtering system; amorphous carbon; nitrogen ... See more keywords
Reticulated shallow etch mesa isolation for controlling surface leakage in GaSb-based infrared detectors
Sign Up to like & getrecommendations! Published in 2017 at "Applied Physics Letters"
DOI: 10.1063/1.4997172
Abstract: Longwave infrared detectors using p-type absorbers composed of InAs-rich type-II superlattices (T2SLs) nearly always suffer from high surface currents due to carrier inversion on the etched sidewalls. Here, we demonstrate reticulated shallow etch mesa isolation… read more here.
Keywords: surface; shallow etch; etch; reticulated shallow ... See more keywords
Study of Size, Shape, and Etch pit formation in InAs/InP Droplet Epitaxy Quantum Dots
Sign Up to like & getrecommendations! Published in 2022 at "Nanotechnology"
DOI: 10.1088/1361-6528/ac659e
Abstract: We investigated metal-organic vapor phase epitaxy grown droplet epitaxy (DE) and Stranski–Krastanov (SK) InAs/InP quantum dots (QDs) by cross-sectional scanning tunneling microscopy (X-STM). We present an atomic-scale comparison of structural characteristics of QDs grown by… read more here.
Keywords: inas inp; quantum dots; formation; droplet epitaxy ... See more keywords
The effect of reactive ion etch (RIE) process conditions on ReRAM device performance
Sign Up to like & getrecommendations! Published in 2017 at "Semiconductor Science and Technology"
DOI: 10.1088/1361-6641/aa7eed
Abstract: The recent surge of research on resistive random access memory (ReRAM) devices has resulted in a wealth of different materials and fabrication approaches. In this work, we describe the performance implications of utilizing a reactive… read more here.
Keywords: ion etch; etch; performance; reactive ion ... See more keywords