Angular dependences of SiO 2 etch rates at different bias voltages in CF 4 , C 2 F 6 , and C 4 F 8 plasmas
Sign Up to like & getrecommendations! Published in 2017 at "Thin Solid Films"
DOI: 10.1016/j.tsf.2017.03.047
Abstract: Abstract The angular dependences of SiO 2 etch rates at different bias voltages for in CF 4 , C 2 F 6 , and C 4 F 8 plasmas were investigated using a Faraday cage… read more here.
Keywords: dependences sio; etch rates; rates different; sio etch ... See more keywords
Bulk etch rates of CR-39 nuclear track detectors over a wide range of etchant (NaOH aqueous solution + ethanol) concentrations: measurements and modeling
Sign Up to like & getrecommendations! Published in 2020 at "Radiation Effects and Defects in Solids"
DOI: 10.1080/10420150.2020.1810038
Abstract: Bulk etch rates for CR-39 detector were measured and studied over a wide range of NaOH aqueous solution concentrations (2–20 N) with different ethanol volumes. This wide range of etching concentration is divided into two… read more here.
Keywords: ethanol; wide range; etch rates; bulk etch ... See more keywords