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   Articles with "etching characteristics" as a keyword



Modified TMAH based etchant for improved etching characteristics on Si{1 0 0} wafer

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recommendations! Published in 2017 at "Journal of Micromechanics and Microengineering"

DOI: 10.1088/1361-6439/aa7588

Abstract: Wet bulk micromachining is a popular technique for the fabrication of microstructures in research labs as well as in industry. However, increasing the throughput still remains an active area of research, and can be done… read more here.

Keywords: improved etching; etching characteristics; surface; convex corners ... See more keywords

Hydrogen Iodide (HI) Neutral Beam Etching Characteristics of InGaN and GaN for Micro-LED Fabrication.

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recommendations! Published in 2023 at "Nanotechnology"

DOI: 10.1088/1361-6528/acd856

Abstract: We investigated the etching characteristics of hydrogen iodide (HI) neutral beam etching (NBE) of GaN and InGaN and compared with Cl2NBE. We showed the advantages of HI NBE vs Cl2NBE, namely: higher InGaN etch rate,… read more here.

Keywords: iodide neutral; hydrogen iodide; beam etching; etching characteristics ... See more keywords

One-Step Etching Characteristics of ITO/Ag/ITO Multilayered Electrode in High-Density and High-Electron-Temperature Plasma

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recommendations! Published in 2021 at "Materials"

DOI: 10.3390/ma14082025

Abstract: This paper presents the dry etching characteristics of indium tin oxide (ITO)/Ag/ITO multilayered thin film, used as a pixel electrode in a high-resolution active-matrix organic light-emitting diode (AMOLED) device. Dry etching was performed using a… read more here.

Keywords: temperature; ito multilayered; ito; etching characteristics ... See more keywords

Investigation into SiO2 Etching Characteristics Using Fluorocarbon Capacitively Coupled Plasmas: Etching with Radical/Ion Flux-Controlled

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recommendations! Published in 2022 at "Nanomaterials"

DOI: 10.3390/nano12244457

Abstract: SiO2 etching characteristics were investigated in detail. Patterned SiO2 was etched using radio-frequency capacitively coupled plasma with pulse modulation in a mixture of argon and fluorocarbon gases. Through plasma diagnostic techniques, plasma parameters (radical and… read more here.

Keywords: fluorocarbon; capacitively coupled; ion flux; sio2 etching ... See more keywords