Effects of etching conditions on surface morphology of periodic inverted trapezoidal patterned Si(100) substrate
Sign Up to like & getrecommendations! Published in 2017 at "Optoelectronics Letters"
DOI: 10.1007/s11801-017-6242-3
Abstract: In this paper, the anisotropic etching process of Si(100) wafers in tetramethyl ammonium hydroxide (TMAH) solution with isopropyl alcohol (IPA) is investigated in detail. An inverted trapezoidal pattern is developed. A series of experiments are… read more here.
Keywords: inverted trapezoidal; microscopy; etching conditions; effects etching ... See more keywords
Makrofol DE 1-4 as alpha dosimeter: Optimum etching conditions
Sign Up to like & getrecommendations! Published in 2018 at "Radiation Physics and Chemistry"
DOI: 10.1016/j.radphyschem.2018.05.013
Abstract: Abstract A reduction of the detection threshold of Makrofol DE 1-4 to be z / β ~ 40 using normal chemical etching (CE) has been achieved for alpha particles tracks in the energy window 1–5 MeV.… read more here.
Keywords: detection; optimum etching; etching conditions; alpha particles ... See more keywords
An Optimization of Electrochemical Etching Conditions for Gold Nanotips Fabrication
Sign Up to like & getrecommendations! Published in 2018 at "Journal of the Korean Physical Society"
DOI: 10.3938/jkps.72.1069
Abstract: We demonstrate a series of experiments to find optimized electrochemical etching condition for fabricating gold nanotip, using square-wave voltage as a bias and using hydrochloric acid diluted by acetone as an etchant. We confirmed that… read more here.
Keywords: etching conditions; conditions gold; electrochemical etching; gold nanotips ... See more keywords