Etching of iron and iron–chromium alloys using ICP-RIE chlorine plasma
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DOI: 10.1088/1361-6595/ac1714
Abstract: The dry etching process of Fe, Cr and Fe–Cr alloys under a chlorine-based plasma is studied. The objective is to create new surface functionalities. The approach combines an experimental study of an ICP (Inductively Coupled… read more here.
Keywords: plasma; iron chromium; plasma etching; iron ... See more keywords