Etching Kinetics of III–V Semiconductors Coupled with Surface Passivation Investigated by Scanning Electrochemical Microscopy
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DOI: 10.1021/acs.jpcc.7b01868
Abstract: Because of their unique physical and electric properties and chemical stability, the etching kinetics of III–V semiconductors is of great significance in the fabrication of functional microdevices. However, the produced oxides result in a surface… read more here.
Keywords: passivation; microscopy; iii semiconductors; kinetics iii ... See more keywords