KOH Wet Etching Mechanisms of III-N Nanopillars: Impact of Temperature and Concentration.
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DOI: 10.1021/acsami.5c01180
Abstract: Combining dry and wet etching processes is a common technique to pattern III-N semiconductors integrated in optoelectronic devices with a controlled final shape and high-quality crystallographic facets. However, the wet mechanisms driving the final pattern… read more here.
Keywords: wet etching; etching mechanisms; hard mask; koh wet ... See more keywords