Anisotropic etching of silicon in KOH + Triton X-100 for 45° micromirror applications
Sign Up to like & getrecommendations! Published in 2017 at "Microsystem Technologies"
DOI: 10.1007/s00542-016-3103-0
Abstract: The etching process of monocrystalline silicon in potassium hydroxide solution with addition of Triton X-100 surfactant at different temperatures is studied. It is shown that decreasing the temperature lowers etch rates and improves surface morphology… read more here.
Keywords: triton 100; koh triton; anisotropic etching; silicon ... See more keywords
Carbon induced galvanic etching of silicon in aerated HF/H2O vapor
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DOI: 10.1016/j.corsci.2019.05.031
Abstract: Abstract Metal-assisted chemical etching of silicon in HF aqueous solutions has aroused great interest due to its potential applications in photovoltaic, thermoelectric, sensors, and batteries. In this work, an alternative carbon induced galvanic etching of… read more here.
Keywords: h2o vapor; etching silicon; galvanic etching; silicon ... See more keywords
Electrochemical local etching of silicon in etchant vapor.
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DOI: 10.1039/c9nr10420h
Abstract: Direct machining and imprinting of Si are beneficial for simplifying the fabrication of microelectromechanical systems, nanoelectromechanical systems, optical devices, and fin field-effect transistors, and for reducing process costs. Electrochemical micromachining has been introduced for highly… read more here.
Keywords: electrochemical local; silicon etchant; local etching; condensation ... See more keywords