Investigation of Normally-Off p-GaN/AlGaN/GaN HEMTs Using a Self-Terminating Etching Technique with Multi-Finger Architecture Modulation for High Power Application
Sign Up to like & getrecommendations! Published in 2021 at "Micromachines"
DOI: 10.3390/mi12040432
Abstract: Normally-off p-gallium nitride (GaN) high electron mobility transistor (HEMT) devices with multi-finger layout were successfully fabricated by use of a self-terminating etching technique with Cl2/BCl3/SF6-mixed gas plasma. This etching technique features accurate etching depth control… read more here.
Keywords: technique; multi finger; etching technique; terminating etching ... See more keywords
Metallic On-Chip Light Concentrators Fabricated by In Situ Plasmonic Etching Technique
Sign Up to like & getrecommendations! Published in 2022 at "Nanomaterials"
DOI: 10.3390/nano12234195
Abstract: One-dimensional tapered metallic nanostructures are highly interesting for nanophotonic applications because of their plasmonic waveguiding and field-focusing properties. Here, we developed an in situ etching technique for unique tapered crystallized silver nanowire fabrication. Under the… read more here.
Keywords: concentrators fabricated; metallic chip; etching technique; light concentrators ... See more keywords