Femtosecond Laser Assisted 3D Etching Using Inorganic-Organic Etchant
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DOI: 10.3390/ma15082817
Abstract: Selective laser etching (SLE) is a technique that allows the fabrication of arbitrarily shaped glass micro-objects. In this work, we show how the capabilities of this technology can be improved in terms of selectivity and… read more here.
Keywords: femtosecond laser; etching using; laser; assisted etching ... See more keywords
Atomic Layer Etching Using a Novel Radical Generation Module
Sign Up to like & getrecommendations! Published in 2023 at "Materials"
DOI: 10.3390/ma16103611
Abstract: To fabricate miniature semiconductors of 10 nm or less, various process technologies have reached their physical limits, and new process technologies for miniaturization are required. In the etching process, problems such as surface damage and… read more here.
Keywords: etching using; atomic layer; layer etching; radical generation ... See more keywords