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Published in 2019 at "Solar Physics"
DOI: 10.1007/s11207-019-1563-y
Abstract: Synoptic maps of solar EUV intensities have been constructed for many decades in order to display the distribution of the different EUV emissions across the solar surface, with each map representing one Carrington rotation (i.e.…
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Keywords:
soho eit;
synoptic maps;
euv;
sdo aia ... See more keywords
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Published in 2020 at "Solar Physics"
DOI: 10.1007/s11207-020-01686-0
Abstract: In this work, we analyze the evolution of an EUV wave front associated with a solar eruption that occurred on 30 October 2014, with the aim of investigating, through differential emission measure (DEM) analysis, the…
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Keywords:
radio data;
analysis;
euv;
estimate plasma ... See more keywords
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Published in 2017 at "Thin Solid Films"
DOI: 10.1016/j.tsf.2017.01.016
Abstract: Abstract The results of a comparative study of Ru-, Mo-, Nb- and Pd- coatings designed for grazing angle applications in the soft X-ray and extreme ultraviolet (EUV) spectrum are presented. Optical properties and temporal stability…
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Keywords:
transition;
optical properties;
euv;
oxidation resistance ... See more keywords
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Published in 2022 at "ACS applied materials & interfaces"
DOI: 10.1021/acsami.1c12411
Abstract: Extreme ultraviolet (EUV)-induced radiation exposure chemistry in organotin-oxo systems, represented by the archetypal [(R-Sn)12O14(OH)6](A)2 cage, has been investigated with density functional theory. Upholding existing experimental evidence of Sn-C cleavage-dominant chemistry, computations have revealed that either…
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Keywords:
molecular euv;
euv;
chemistry;
advantages organotin ... See more keywords
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Published in 2025 at "ACS Applied Materials & Interfaces"
DOI: 10.1021/acsami.5c09589
Abstract: Extreme ultraviolet (EUV) lithography has revolutionized the high-volume manufacturing of nanoscale components. The use of EUV light leads to ionization-driven chemistry in the imaging materials of lithography, the photoresists. The complex interplay of ionization, generation…
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Keywords:
euv photoemission;
spectroscopy;
table top;
euv ... See more keywords
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Published in 2024 at "Space Weather"
DOI: 10.1029/2023sw003772
Abstract: A new method to nowcast spectral irradiance in extreme ultraviolet (EUV) and far ultraviolet (FUV) bands is presented here, utilizing only solar photospheric magnetograms and the Mg II index (i.e., the core‐to‐wing ratio). The EUV…
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Keywords:
photospheric magnetic;
model;
index;
euv fuv ... See more keywords
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Published in 2025 at "Nature Communications"
DOI: 10.1038/s41467-025-60499-6
Abstract: Identifying materials with optimal optoelectronic properties for targeted applications represents both a critical need and a persistent challenge in optoelectronic device engineering. Machine learning models often depend on extensive datasets, which are typically lacking in…
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Keywords:
experimental validation;
machine learning;
prediction;
extreme ultraviolet ... See more keywords
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Published in 2017 at "Materials Chemistry Frontiers"
DOI: 10.1039/c7qm00343a
Abstract: Although many organic polymer based photoresists are useful for patterning high resolution sub-20 nm technology nodes, many such resists suffer from poor sensitivity. One of the methods to address the problem of low sensitivity is…
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Keywords:
resolution;
high resolution;
organic polymer;
sensitivity ... See more keywords
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Published in 2024 at "Nanoscale"
DOI: 10.1039/d4nr01332h
Abstract: Extreme ultraviolet (EUV) lithography is the leading lithography technique in CMOS mass production, moving towards the sub-10 nm half-pitch (HP) regime with the ongoing development of the next generation high numerical aperture (high NA) EUV…
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Keywords:
lithography;
resolution;
ultraviolet lithography;
extreme ultraviolet ... See more keywords
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1
Published in 2019 at "Journal of Applied Physics"
DOI: 10.1063/1.5115785
Abstract: Xe laser-produced plasma with a gas-jet target is considered a promising λ = 11.2-nm radiation source for a possible extension of the EUV (Extreme UltraViolet) lithography. EUV spectra of the plasma radiation obtained with the aid of…
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Keywords:
laser;
euv radiation;
euv;
conversion efficiency ... See more keywords
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Published in 2023 at "Physics of Plasmas"
DOI: 10.1063/5.0147234
Abstract: Discharge- and laser-produced plasma (DLPP) devices are being used as light sources for extreme ultraviolet (EUV) generation. A key challenge for both, DPP and LPP, is achieving sufficient brightness to support the throughput requirements of…
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Keywords:
laser;
discharge laser;
euv;
laser produced ... See more keywords