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Published in 2019 at "Solar Physics"
DOI: 10.1007/s11207-019-1563-y
Abstract: Synoptic maps of solar EUV intensities have been constructed for many decades in order to display the distribution of the different EUV emissions across the solar surface, with each map representing one Carrington rotation (i.e.…
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Keywords:
soho eit;
synoptic maps;
euv;
sdo aia ... See more keywords
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Published in 2020 at "Solar Physics"
DOI: 10.1007/s11207-020-01686-0
Abstract: In this work, we analyze the evolution of an EUV wave front associated with a solar eruption that occurred on 30 October 2014, with the aim of investigating, through differential emission measure (DEM) analysis, the…
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Keywords:
radio data;
analysis;
euv;
estimate plasma ... See more keywords
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Published in 2017 at "Thin Solid Films"
DOI: 10.1016/j.tsf.2017.01.016
Abstract: Abstract The results of a comparative study of Ru-, Mo-, Nb- and Pd- coatings designed for grazing angle applications in the soft X-ray and extreme ultraviolet (EUV) spectrum are presented. Optical properties and temporal stability…
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Keywords:
transition;
optical properties;
euv;
oxidation resistance ... See more keywords
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Published in 2022 at "ACS applied materials & interfaces"
DOI: 10.1021/acsami.1c12411
Abstract: Extreme ultraviolet (EUV)-induced radiation exposure chemistry in organotin-oxo systems, represented by the archetypal [(R-Sn)12O14(OH)6](A)2 cage, has been investigated with density functional theory. Upholding existing experimental evidence of Sn-C cleavage-dominant chemistry, computations have revealed that either…
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Keywords:
molecular euv;
euv;
chemistry;
advantages organotin ... See more keywords
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Published in 2017 at "Materials Chemistry Frontiers"
DOI: 10.1039/c7qm00343a
Abstract: Although many organic polymer based photoresists are useful for patterning high resolution sub-20 nm technology nodes, many such resists suffer from poor sensitivity. One of the methods to address the problem of low sensitivity is…
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Keywords:
resolution;
high resolution;
organic polymer;
sensitivity ... See more keywords
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Published in 2019 at "Journal of Applied Physics"
DOI: 10.1063/1.5115785
Abstract: Xe laser-produced plasma with a gas-jet target is considered a promising λ = 11.2-nm radiation source for a possible extension of the EUV (Extreme UltraViolet) lithography. EUV spectra of the plasma radiation obtained with the aid of…
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Keywords:
laser;
euv radiation;
euv;
conversion efficiency ... See more keywords
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Published in 2023 at "Physics of Plasmas"
DOI: 10.1063/5.0147234
Abstract: Discharge- and laser-produced plasma (DLPP) devices are being used as light sources for extreme ultraviolet (EUV) generation. A key challenge for both, DPP and LPP, is achieving sufficient brightness to support the throughput requirements of…
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Keywords:
laser;
discharge laser;
euv;
laser produced ... See more keywords
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Published in 2020 at "IEEE Transactions on Semiconductor Manufacturing"
DOI: 10.1109/tsm.2019.2963483
Abstract: As extreme ultraviolet (EUV) lithography enters high volume manufacturing (HVM) to enable the sub-7nm scaling roadmap, characterizing and monitoring defects that print at wafer level are of critical importance to yield. This is especially true…
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Keywords:
stochastic defects;
euv;
ultraviolet euv;
inspection ... See more keywords
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2
Published in 2023 at "Science"
DOI: 10.1126/science.adg6881
Abstract: Extreme ultraviolet (EUV) radiation is a key technology for material science, attosecond metrology, and lithography. Here, we experimentally demonstrate metasurfaces as a superior way to focus EUV light. These devices exploit the fact that holes…
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Keywords:
extreme ultraviolet;
vacuum guiding;
euv;
ultraviolet metalens ... See more keywords
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Published in 2023 at "Optics express"
DOI: 10.1364/oe.485779
Abstract: We present high-speed and wide-field EUV ptychography at 13.5 nm wavelength using a table-top high-order harmonic source. Compared to previous measurements, the total measurement time is significantly reduced by up to a factor of five by…
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Keywords:
speed;
euv;
wide field;
scmos detector ... See more keywords
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Published in 2023 at "Materials"
DOI: 10.3390/ma16093471
Abstract: Defect control of extreme ultraviolet (EUV) masks using pellicles is challenging for mass production in EUV lithography because EUV pellicles require more critical fabrication than argon fluoride (ArF) pellicles. One of the fabrication requirements is…
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Keywords:
transverse deflection;
euv;
extreme ultraviolet;
deflection extreme ... See more keywords