Effect of rubidium incorporation on the optical properties and intermixing in Mo/Si multilayer mirrors for EUV lithography applications
Sign Up to like & getrecommendations! Published in 2020 at "Applied Surface Science"
DOI: 10.1016/j.apsusc.2019.144951
Abstract: Abstract High reflectivity and long-term stability in multilayer mirrors (MLMs) are crucial for extreme ultraviolet (EUV) photolithography. The conventional base stack to reflect 13.5 nm light is a Mo/Si multilayer, which offers a maximum theoretical reflectivity… read more here.
Keywords: euv lithography; reflectivity; effect; rubidium ... See more keywords
Tuning photoionization mechanisms of molecular hybrid materials for EUV lithography applications
Sign Up to like & getrecommendations! Published in 2019 at "Journal of Materials Chemistry C"
DOI: 10.1039/c8tc05273e
Abstract: Aromatic structures in organic shell stabilize photoionization products of metal oxo clusters, a new type of materials for EUV lithography. read more here.
Keywords: photoionization mechanisms; tuning photoionization; materials euv; mechanisms molecular ... See more keywords
Demonstration of a ring-FEL as an EUV lithography tool.
Sign Up to like & getrecommendations! Published in 2020 at "Journal of synchrotron radiation"
DOI: 10.1107/s1600577520005676
Abstract: This paper presents the required structure and function of a ring-FEL as a radiation source for extreme ultraviolet radiation lithography (EUVL). A 100 m-long straight section that conducts an extremely low emittance beam from a fourth-generation… read more here.
Keywords: ring fel; euv lithography; lithography tool; lithography ... See more keywords
EUV lithography finally ready for fabs
Sign Up to like & getrecommendations! Published in 2018 at "IEEE Spectrum"
DOI: 10.1109/mspec.2018.8241736
Abstract: "A fab is like an iceberg," someone tells me. I can't tell who because we're all covered head to toe in clean-room garb. A tour of GlobalFoundries' Fab 8 in Malta, N.Y., certainly reinforces that… read more here.
Keywords: euv lithography; finally ready; lithography finally; ready fabs ... See more keywords
Inspection of Stochastic Defects With Broadband Plasma Optical Systems for Extreme Ultraviolet (EUV) Lithography
Sign Up to like & getrecommendations! Published in 2020 at "IEEE Transactions on Semiconductor Manufacturing"
DOI: 10.1109/tsm.2019.2963483
Abstract: As extreme ultraviolet (EUV) lithography enters high volume manufacturing (HVM) to enable the sub-7nm scaling roadmap, characterizing and monitoring defects that print at wafer level are of critical importance to yield. This is especially true… read more here.
Keywords: stochastic defects; euv; ultraviolet euv; inspection ... See more keywords
Resistless EUV lithography: Photon-induced oxide patterning on silicon
Sign Up to like & getrecommendations! Published in 2023 at "Science Advances"
DOI: 10.1126/sciadv.adf5997
Abstract: In this work, we show the feasibility of extreme ultraviolet (EUV) patterning on an HF-treated silicon (100) surface in the absence of a photoresist. EUV lithography is the leading lithography technique in semiconductor manufacturing due… read more here.
Keywords: lithography; euv lithography; resistless euv; silicon ... See more keywords
Fast aerial image model for EUV lithography using the adjoint fully convolutional network.
Sign Up to like & getrecommendations! Published in 2022 at "Optics express"
DOI: 10.1364/oe.452420
Abstract: The effects of thick-mask and oblique incidence in extreme ultraviolet (EUV) lithography system make the aerial image calculation a challenging task. This paper develops a fast EUV lithography aerial image model based on a new… read more here.
Keywords: lithography; euv lithography; adjoint; aerial image ... See more keywords