Evidence for the formation of SiGe nanoparticles in Ge-implanted Si3N4
Sign Up to like & getrecommendations! Published in 2017 at "Journal of Applied Physics"
DOI: 10.1063/1.4977507
Abstract: SiGe nanoparticles were formed in an amorphous Si3N4 matrix by Ge+ ion implantation and thermal annealing. The size of the nanoparticles was determined by transmission electron microscopy and their atomic structure by x-ray absorption spectroscopy.… read more here.
Keywords: concentration annealing; sige nanoparticles; evidence formation; implantation ... See more keywords