Phase evolution of ultra-thin Ni silicide films on CF4 plasma immersion ion implanted Si.
Sign Up to like & getrecommendations! Published in 2020 at "Nanotechnology"
DOI: 10.1088/1361-6528/ab6d21
Abstract: We present a systematic study on the effects of CF4 plasma immersion ion implantation (PIII) in Si on the phase evolution of ultra-thin Ni silicides. For 3 nm Ni, NiSi2 was formed on Si substrates… read more here.
Keywords: evolution; immersion ion; phase evolution; plasma immersion ... See more keywords