Exposure-dependent refractive index of Nanoscribe IP-Dip photoresist layers.
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DOI: 10.1364/ol.44.000029
Abstract: The refractive indices of photoresists used for direct laser writing (DLW) have been determined after exposure to ultraviolet (UV) light. However, it was anticipated that the refractive index will differ when applying a two-photon polymerization… read more here.
Keywords: dip; dependent refractive; exposure dependent; refractive index ... See more keywords