Multi-objective lithographic source mask optimization to reduce the uneven impact of polarization aberration at full exposure field.
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DOI: 10.1364/oe.27.015604
Abstract: Source and mask optimization (SMO) technology based on vectorial image model is indispensable in immersion lithography process at advanced technology node. Many kinds of algorithms have achieved successes in aspect of fast and robust SMO… read more here.
Keywords: field; exposure field; impact; full exposure ... See more keywords