Sign Up to like & get
recommendations!
2
Published in 2023 at "Small"
DOI: 10.1002/smll.202207207
Abstract: In this study, a 96-well exposure system for safety assessment of nanomaterials is developed and characterized using an air-liquid interface lung epithelial model. This system is designed for sequential nebulization. Distribution studies verify the reproducible…
read more here.
Keywords:
system;
safety assessment;
exposure;
exposure system ... See more keywords
Sign Up to like & get
recommendations!
0
Published in 2021 at "Bioelectrochemistry"
DOI: 10.1016/j.bioelechem.2021.107790
Abstract: The effects and mechanisms of ultrashort and intense pulsed electric fields on biological cells remain some unknown. Especially for picosecond pulsed electric fields (psPEF) with a high pulse repetition rate, electroporation or nanoporation effects could…
read more here.
Keywords:
exposure system;
biological cells;
electric fields;
pulsed electric ... See more keywords
Sign Up to like & get
recommendations!
0
Published in 2019 at "Chemico-biological interactions"
DOI: 10.1016/j.cbi.2018.11.025
Abstract: Inhalation of the chemical warfare agent sulfur mustard (SM) is associated with severe acute and long-term pulmonary dysfunctions and health effects. The still not completely elucidated molecular toxicology and a missing targeted therapy emphasize the…
read more here.
Keywords:
exposure system;
sulfur mustard;
exposure;
ali ... See more keywords
Sign Up to like & get
recommendations!
1
Published in 2022 at "Environmental science & technology"
DOI: 10.1021/acs.est.2c01119
Abstract: In this work, a typical congener of short-chain chlorinated paraffins (SCCPs) with six chlorine atoms (CP-4, 1,2,5,6,9,10-C10H16Cl6, 250 ng/mL) was selected to elaborate the comprehensive environmental transformation of SCCPs in rice seedling exposure system. CP-4…
read more here.
Keywords:
transformation;
chain chlorinated;
exposure system;
short chain ... See more keywords
Sign Up to like & get
recommendations!
0
Published in 2020 at "Optical Engineering"
DOI: 10.1117/1.oe.59.3.034109
Abstract: Abstract. As the critical dimensions of integrated circuits continue to grow smaller, overlay error is becoming increasingly important. Overlay error is mainly determined by the telecentricity of the exposure system in a photolithography tool. Existing…
read more here.
Keywords:
exposure system;
system photolithography;
telecentricity;
measurement ... See more keywords