Exit Recursion Models of Clustered Photolithography Tools for Fab Level Simulation
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DOI: 10.1109/tsm.2016.2618894
Abstract: In semiconductor wafer fabricators (fabs), clustered photolithography tools (CPTs) are often the bottleneck. With a focus on fab-level simulation, we propose a new class of equipment models for CPTs called exit recursion models (ERMs). These… read more here.
Keywords: photolithography tools; clustered photolithography; model; level simulation ... See more keywords