Characterizations and growth of textured well-faceted ZnO films by low-pressure chemical vapor deposition on ITO glass substrates
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DOI: 10.1016/j.spmi.2017.08.015
Abstract: Abstract In this work, textured well-faceted ZnO films with 0.5 and 2.0 μm film thickness grown on indium tin oxide (ITO) glass substrates by low-pressure chemical vapor deposition (LPCVD) are analyzed by x-ray diffraction (XRD), scanning… read more here.
Keywords: zno film; well faceted; faceted zno; zno ... See more keywords