Structural and electrical properties of ferroelectric BiFeO3/HfO2 gate stack for nonvolatile memory applications
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DOI: 10.1142/s2010135x18500376
Abstract: Difficulties in the fabrication of direct interface of ferroelectric BiFeO3 on the gate of ferroelectric field effect transistor (FeFET) is well known. This paper reports the optimization and fabri... read more here.
Keywords: properties ferroelectric; structural electrical; ferroelectric bifeo3; gate ... See more keywords