Ferroelectricity of hafnium oxide-based materials: Current status and future prospects from physical mechanisms to device applications
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DOI: 10.1088/1674-4926/44/5/053101
Abstract: The finding of the robust ferroelectricity in HfO2-based thin films is fantastic from the view point of both the fundamentals and the applications. In this review article, the current research status of the future prospects… read more here.
Keywords: hfo2 based; future prospects; status future; ferroelectricity hafnium ... See more keywords