Development of a flux-film-coated sputtering (FFC-sputtering) method for fabricating c-axis oriented AlN film
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DOI: 10.1063/5.0025736
Abstract: In this study, we developed a novel growth method named “Flux-Film-Coated (FFC) sputtering.” In this method, nitrogen radicals were supplied to the Al–Sn flux at around 600 °C followed by the deposition of an Al–Sn metal… read more here.
Keywords: flux; sputtering method; method; film ... See more keywords