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Published in 2020 at "Microscopy and Microanalysis"
DOI: 10.1017/s1431927620014580
Abstract: During past several years, plasma FIB has been established as a routine technique in semiconductor failure analysis and materials science. It offers a wide range of FIB applications like creating big and artefactfree cross sections…
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Keywords:
generation plasma;
new generation;
plasma fib;
column higher ... See more keywords