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Published in 2021 at "Micromachines"
DOI: 10.3390/mi12060632
Abstract: In micro-electrical-mechanical systems (MEMS), thick structures with high aspect ratios are often required. Dry film photoresist (DFR) in various thicknesses can be easily laminated and patterned using standard UV lithography. Here, we present a three-level…
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Keywords:
film resist;
impedance measurements;
electrical impedance;
impedance ... See more keywords