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Published in 2019 at "Nanomaterials"
DOI: 10.3390/nano9030476
Abstract: Tantalum oxynitride thin films have been deposited by reactive magnetron sputtering, using a fixed proportion reactive gas mixture (85% N2 + 15% O2). To produce the films, the partial pressure of the mixture in the…
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Keywords:
thin films;
capacity;
films assessment;
tantalum oxynitride ... See more keywords